TAILORING THE STRUCTURE AND FUNCTIONAL PROPERTIES OF TITANIUM-BASED THIN FILMS THROUGH CONTROLLED DEPOSITION PARAMETERS FOR MECHANICAL AND BIOMEDICAL APPLICATIONS

Аннотация

This study examines the structure and surface characteristics of Ti–Au thin films and coatings deposited by the PVD magnetron sputtering method in a vacuum/argon/nitrogen environment at an elevated temperature of 450 °C using direct-current and radio-frequency sputtering modes. Based on a series of experimental investigations aimed at determining the optimal deposition conditions, the synthesized thin films and coatings were designated as follows: Ti–Au (TR-1), Ti–Au–Ag (TR-2), (Ti–Au–Ag)N (TR-3), Ti–Au–Cu (TR-4), and (Ti–Au–Cu)N (TR-5). The NanoPVD system was utilized to deposit coatings with a consistent mean thickness of roughly 1 µm. Experimental data indicate that the coatings' chemical makeup, microstructure, and functional behavior are highly sensitive to magnetron sputtering parameters. The influence of Ag and Cu doping on the mechanical and microstructural properties of Ti–Au films was analyzed via SEM/EDX and XRD. Furthermore, AFM was employed to assess surface roughness, while nanoindentation and tribological testing provided a thorough evaluation of mechanical performance. Findings confirm that PVD-based surface modification of Ti₆Al₄V substrates substantially improves wear resistance and lowers friction coefficients. XRD analysis suggests that these enhanced tribological properties are primarily linked to the development and increased volume fraction of the Ti₃Au (β) phase.